MIT.nano
IAP Course: MIT.nano: How to think like a VR developer
| Jan/30 | Tue | 10:00AM–12:00PM |
This is a beginner’s hands-on guide for getting started in VR/AR development. We will introduce the fundamentals of working in virtual reality, explain the basic pipeline, and provide support for you to complete a project. This workshop is designed to give you hands-on experience working with a game engine (Unity) and iterative design of VR/AR experiences. No prior experience with VR or coding is required.
Instructors: Talis Reks, AR/VR/Gaming/Big Data IT Technologist; Y. Jenny Wang, Lecturer, XR developer, researcher, and consultant
Advanced sign-up is required. Register by Monday, January 22, 2024.
Open to MIT Community. Limited to 15 participants.
IAP Course: MIT.nano: Into the Structure-Verse: An introduction to crystallographic structure determination with x-rays and electrons
| Jan/17 | Wed | 09:00AM–01:00PM |
| Jan/18 | Thu | 09:00AM–01:00PM |
This course is designed to introduce attendees to best practices in crystallographic structure determination with x-rays and electrons. Attendees will learn about XRD, electron diffraction, and scanning transmission electron microscopy on crystalline materials, with a primary focus on data analysis. A hands-on lab will be offered for XRD structure model refinement as well as an introduction to image analysis with the python package Atomap.
Previous python experience is not required, but attendees will find introductory experience helpful. It is encouraged that attendees download anaconda before the course begins. This will be a 2-day course: one day for X-rays and one day for electrons. We welcome students who may not have formal education in crystallography, XRD and/or TEM
Instructors: Aubrey Penn, Research Specialist; Jordan Cox, Research Specialist
Registration closed - course is full
IAP Course: MIT.nano: Make your own chip inside the lab!
| Jan/09 | Tue | 02:00PM–05:00PM |
| Jan/11 | Thu | 09:00AM–12:00PM |
| Jan/15 | Mon | 02:00PM–05:00PM |
| Jan/17 | Wed | 09:00AM–12:00PM |
| Jan/19 | Fri | 02:00PM–05:00PM |
| Jan/20 | Sat | 02:00PM–05:00PM |
| Jan/26 | Fri | 02:00PM–05:00PM |
| Jan/26 | Fri | 06:00PM–09:00PM |
| Jan/30 | Tue | 09:00AM–12:00PM |
| Jan/30 | Tue | 02:00PM–05:00PM |
Step inside MIT.nano’s fab to create a 1x1 inch chip with your favorite image to take home with you! We will work inside the MIT.nano cleanroom: learn how to gown up, understand the different fab tools, and use the tools to pattern a 50 nm thin layer of aluminum with your design. At the end, we will separate out the chips from the wafer, and you get a chance to put your chip in a small frame or carrier to take with you.
Each session is limited to 12 students. On the registration form, please indicate at which sessions you would be available.
Instructor: Jorg Scholvin, Assistant Director of User Services, Fab.nano
Registration deadline: January 8, 2024
We will begin communicating assigned dates and times on January 2, 2024
MIT.nano: A Brief Introduction to e-beam Lithography
| Jan/18 | Thu | 01:00PM–02:30PM |
E-beam lithography enables advanced semiconductor chips; without e-beam lithography minimum features sizes would be limited to approximately 200 nm. In research environments e-beam lithography allows direct write, maskless lithography enabling quick and relatively cheap design changes.
This talk introduces the basics of e-beam lithography and pattern transfer, including electron energy, material interaction, limits to resolution, e-beam resists, throughput, proximity effect correction, and characteristics of different e-beam lithography tools.
Anyone interested in e-beam lithography, from neophyte to experienced users should be able to gain something from this talk.
Instructors: Mark Mondol, Assistant Director of Nano Structures Laboratory; Juan Ferrera, Research Scientist
Registration is now closed
Registration deadline: January 17, 2024